Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications
2015
Article
mms
Author(s): | Jeong, H.-H. and Mark, A. G. and Lee, T.-C. and Son, K. and Chen, W. and Alarcón-Correa, M. and Kim, I. and Schütz, G. and Fischer, P. |
Journal: | {Advanced Science} |
Volume: | 2 |
Number (issue): | 2 |
Year: | 2015 |
Publisher: | Wiley-VCH |
Department(s): | Modern Magnetic Systems |
Bibtex Type: | Article (article) |
Address: | Weinheim |
DOI: | 10.1002/advs.201500016 |
Language: | eng |
BibTex @article{escidoc:0119, title = {{Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications}}, author = {Jeong, H.-H. and Mark, A. G. and Lee, T.-C. and Son, K. and Chen, W. and Alarc\'on-Correa, M. and Kim, I. and Sch\"utz, G. and Fischer, P.}, journal = {{Advanced Science}}, volume = {2}, number = {2}, publisher = {Wiley-VCH}, address = {Weinheim}, year = {2015}, doi = {10.1002/advs.201500016} } |