Cover Article
- 22 July 2015
- Micro, Nano, and Molecular Systems
Our paper "Selectable nanopattern arrays for nanolithographic imprint and etch-mask applications" is the cover article for Advanced Science, May 6, 2015, DOI: 10.1002/advs.201500016
A parallel nanolithographic patterning method is presented by P. Fischer and co-workers in article number 1500016 that can be used to obtain arrays of multifunctional nanoparticles. These patterns can simply be converted into a variety of secondary nanopatterns that are useful for nanolithographic imprint, plasmonic, and etch-mask applications. Image by Alejandro Posada Boada.
Selectable Nanopattern Arrays for Nanolithographic Imprint and Etch-Mask Applications→
People
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Andrew Mark
PostDoc, Petzow Prize winner (2015), now Manager of Optical Engineering at Metamaterial Technologies Inc. (MTI), Nova Scotia, Canada.
Alumni
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Tung Chun Lee
PostDoc, now Lecturer, Institute for Materials Discovery, University College London
Alumni